A method of forming the buffer layer in the LTPS products

The present invention exposes a method of forming the buffer layer in the LTPS products. The method comprises the following steps: heat the substrate so as to make the alkali metal ions diffuse to the surface of the glass; wash the substrate by acid so as to make the alkali metal ions leave the surface of the glass; form the buffer layer on the glass which has been heated and washed by acid, wherein the material of the buffer layer is SiOx. The method of the present invention based on the design of the buffer layer, it can promote the capacity. Further more, it can avoid the cross contamination of the different layers so as to promote characteristic of the element.