Vacuum vapor deposition device and vacuum vapor deposition method
This invention provides a vacuum vapor deposition device and method capable of increasing the thickness uniformity of an organic EL film. The vacuum vapor deposition device comprises a guide channel for transporting evaporation material obtained from an evaporation source, and a release part for rel...
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| creator | DAIKU, HIROYUKI |
| description | This invention provides a vacuum vapor deposition device and method capable of increasing the thickness uniformity of an organic EL film. The vacuum vapor deposition device comprises a guide channel for transporting evaporation material obtained from an evaporation source, and a release part for releasing the evaporation material toward the parts under vapor deposition. The release part comprises a dispersion container for diffusing the evaporation material and a plurality of nozzle parts. The nozzle parts are arranged protruding toward the parts under vapor deposition and provided with contracted openings at the front for releasing the evaporation material. Each nozzle part has an inner diameter D, a length L and a contracted opening diameter D'. The release part has a mechanism for adjusting the flow of the evaporation material in each nozzle part to a specified value. The inner diameter D (mm), length L (mm) and contracted opening diameter D' (mm) of the nozzle parts satisfy the following relationship: L ≥ |
| format | Patent |
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The vacuum vapor deposition device comprises a guide channel for transporting evaporation material obtained from an evaporation source, and a release part for releasing the evaporation material toward the parts under vapor deposition. The release part comprises a dispersion container for diffusing the evaporation material and a plurality of nozzle parts. The nozzle parts are arranged protruding toward the parts under vapor deposition and provided with contracted openings at the front for releasing the evaporation material. Each nozzle part has an inner diameter D, a length L and a contracted opening diameter D'. The release part has a mechanism for adjusting the flow of the evaporation material in each nozzle part to a specified value. The inner diameter D (mm), length L (mm) and contracted opening diameter D' (mm) of the nozzle parts satisfy the following relationship: L ≥</description><language>chi ; eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2014</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140801&DB=EPODOC&CC=TW&NR=201430157A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140801&DB=EPODOC&CC=TW&NR=201430157A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>DAIKU, HIROYUKI</creatorcontrib><title>Vacuum vapor deposition device and vacuum vapor deposition method</title><description>This invention provides a vacuum vapor deposition device and method capable of increasing the thickness uniformity of an organic EL film. The vacuum vapor deposition device comprises a guide channel for transporting evaporation material obtained from an evaporation source, and a release part for releasing the evaporation material toward the parts under vapor deposition. The release part comprises a dispersion container for diffusing the evaporation material and a plurality of nozzle parts. The nozzle parts are arranged protruding toward the parts under vapor deposition and provided with contracted openings at the front for releasing the evaporation material. Each nozzle part has an inner diameter D, a length L and a contracted opening diameter D'. The release part has a mechanism for adjusting the flow of the evaporation material in each nozzle part to a specified value. 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The vacuum vapor deposition device comprises a guide channel for transporting evaporation material obtained from an evaporation source, and a release part for releasing the evaporation material toward the parts under vapor deposition. The release part comprises a dispersion container for diffusing the evaporation material and a plurality of nozzle parts. The nozzle parts are arranged protruding toward the parts under vapor deposition and provided with contracted openings at the front for releasing the evaporation material. Each nozzle part has an inner diameter D, a length L and a contracted opening diameter D'. The release part has a mechanism for adjusting the flow of the evaporation material in each nozzle part to a specified value. The inner diameter D (mm), length L (mm) and contracted opening diameter D' (mm) of the nozzle parts satisfy the following relationship: L ≥</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | Vacuum vapor deposition device and vacuum vapor deposition method |
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