Vacuum vapor deposition device and vacuum vapor deposition method

This invention provides a vacuum vapor deposition device and method capable of increasing the thickness uniformity of an organic EL film. The vacuum vapor deposition device comprises a guide channel for transporting evaporation material obtained from an evaporation source, and a release part for releasing the evaporation material toward the parts under vapor deposition. The release part comprises a dispersion container for diffusing the evaporation material and a plurality of nozzle parts. The nozzle parts are arranged protruding toward the parts under vapor deposition and provided with contracted openings at the front for releasing the evaporation material. Each nozzle part has an inner diameter D, a length L and a contracted opening diameter D'. The release part has a mechanism for adjusting the flow of the evaporation material in each nozzle part to a specified value. The inner diameter D (mm), length L (mm) and contracted opening diameter D' (mm) of the nozzle parts satisfy the following relationship: L ≥