Novel acryl monomer, polymer and resist composition comprising the same

An acryl monomer, useful for forming tiny resistance pattern having excellent features of sensitivity, resolution, and improved line edge roughness, of the following formula is provided. A resist polymer including a repeat unit derivated from the acryl monomer, and a resist composition having the sa...

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Bibliographische Detailangaben
Hauptverfasser:	JEON, JONG-JIN, OH, HYUN-SEOK, HAN, JOON-HEE, KIM, JIN-HO, SEO, DONGUL
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	An acryl monomer, useful for forming tiny resistance pattern having excellent features of sensitivity, resolution, and improved line edge roughness, of the following formula is provided. A resist polymer including a repeat unit derivated from the acryl monomer, and a resist composition having the same are also provided. In the formula above, each substituent is as the same defined in the specification.