Lithographic apparatus and method

There is disclosed a lithographic apparatus provided with a spectral purity filter which may be provided in one or more of the following locations: (a) in the illumination system, (b) adjacent the patterning device, either a static location in the radiation beam or fixed for movement with the patter...

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Bibliographische Detailangaben
Hauptverfasser:	LUIJTEN, CARLO CORNELIS MARIA, NIENHUYS, HAN-KWANG, BANINE, VADIM YEVGENYEVICH, MINNAERT, ARTHUR WINFRIED EDUARDUS, MUITJENS, MARCEL JOHANNUS ELISABETH HUBERTUS, RIZO DIAGO, PEDRO JULIAN, YAKUNIN, ANDREI MIKHAILOVICH, GASSELING, PAULUS ALBERTUS MARIA, SCACCABAROZZI, LUIGI, BAL, KURSAT, VAN KAMPEN, MAARTEN, MALLMANN, HANS JOERG, HUIJBERTS, ALEXANDER MARINUS ARNOLDUS, VAN AERLE, NICOLAAS ALDEGONDA JAN MARIA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	There is disclosed a lithographic apparatus provided with a spectral purity filter which may be provided in one or more of the following locations: (a) in the illumination system, (b) adjacent the patterning device, either a static location in the radiation beam or fixed for movement with the patterning device, (c) in the projection system, and (d) adjacent the substrate table. The spectral purity filter is preferably a membrane formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer.