Method for forming flexible solar cells

The invention provides for a semiconductor wafer with a metal support element suitable for the formation of a flexible or sag tolerant photovoltaic cell. A method for forming a photovoltaic cell may comprise providing a semiconductor wafer have a thickness greater than 150 m, the wafer having a firs...

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Bibliographische Detailangaben
Hauptverfasser: MURALI, VENKATESAN, DINAN, JR. THOMAS EDWARD, LELAND, ORION, PRABHU, GOPAL
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention provides for a semiconductor wafer with a metal support element suitable for the formation of a flexible or sag tolerant photovoltaic cell. A method for forming a photovoltaic cell may comprise providing a semiconductor wafer have a thickness greater than 150 m, the wafer having a first surface and a second surface opposite the first and etching the semiconductor wafer a first time so that the first etching reduces the thickness of the semiconductor wafer to less than 150 m. After the wafer has been etched a first time, a metal support element may be constructed on or over the first surface; and a photovoltaic cell may be fabricated, wherein the semiconductor wafer comprises the base of the photovoltaic cell.