Fiber delivery for metrology systems used in lithography tools

Metrology system, apparatus and method used to implement measurements inside a lithography tool are described, such that the disclosed measurements can be performed without contributing outgassed effluent within the lithography tool. Disclosed is a system including: an objective; a stage to execute...

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Bibliographische Detailangaben
1. Verfasser:	REDLITZ, KURT
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Metrology system, apparatus and method used to implement measurements inside a lithography tool are described, such that the disclosed measurements can be performed without contributing outgassed effluent within the lithography tool. Disclosed is a system including: an objective; a stage to execute motions relative to the objective; an optical sensor for producing an optical monitoring signal associated with the motions of the stage; and a glass optical fiber having a metal outer coating, the metal-coated glass optical fiber being arranged to provide light to, or collect light from, the optical sensor.