Slurry composition

A slurry composition is provided. The slurry composition includes abrasives having metal ions absorbed thereon, an oxidant and quaternary ammonium containing at least one benzyl group.

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Hauptverfasser: CHIANG, CHUNG-WEI, HO, YUN-LUNG, CHANG, SONG-YUAN, LU, MING-HUI
Format: Patent
Sprache:chi ; eng
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creator CHIANG, CHUNG-WEI
HO, YUN-LUNG
CHANG, SONG-YUAN
LU, MING-HUI
description A slurry composition is provided. The slurry composition includes abrasives having metal ions absorbed thereon, an oxidant and quaternary ammonium containing at least one benzyl group.
format Patent
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language chi ; eng
recordid cdi_epo_espacenet_TW201323589A
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subjects ADHESIVES
BASIC ELECTRIC ELEMENTS
CHEMISTRY
DYES
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
PAINTS
POLISHES
SEMICONDUCTOR DEVICES
title Slurry composition
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