Method and device for carrying out liquid level adjustment in continuous equipment

The invention relates to a method of allowing precise maintenance of desired relative perpendicular distance between a substrate and a liquid surface in a period of unilaterally processing a planar object based on liquid, and a device thereof. The method includes the steps of: comparing a liquid lev...

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Bibliographische Detailangaben
1. Verfasser: BAIER, MARCUS
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention relates to a method of allowing precise maintenance of desired relative perpendicular distance between a substrate and a liquid surface in a period of unilaterally processing a planar object based on liquid, and a device thereof. The method includes the steps of: comparing a liquid level actual value related to the current perpendicular distance and a liquid level ideal value related to the desired perpendicular distance by an adjustment equipment; an adjustment equipment generating an ideal adjusted value for achieving liquid level ideal value when deviating from the liquid level ideal value; and the adjustment equipment transmitting the ideal adjusted value to an equipment for controlling relative perpendicular distance. The method is characterized in that the liquid level actual value is acquired based on the total surface area of the liquid in a waste pool contacted by the planar object. The device of the present invention includes an adjustment equipment, an equipment for controlling relati