Surface treatment method by using the NH3 plasma treatment to modify the sensing thin-film

The NH3 plasma treatment by remote plasma is firstly proposed to replace the covalent bonding process during surface modification procedure that for amine bond generation.

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Bibliographische Detailangaben
Hauptverfasser:	YANG, PO-LUNG, LAI, CHAO-SUNG, LIN, YI-TING, CHUANG, WEN-YU, CHEN, JYH-PING, LU, TSENG-FU, YU, TINGUN, CHOU, CHIEN, YU, JAU-SONG, CHANG, YU-SUN, WANG, I-SHUN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIAGNOSIS DIFFUSION TREATMENT OF METALLIC MATERIAL HUMAN NECESSITIES HYGIENE IDENTIFICATION INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEDICAL OR VETERINARY SCIENCE METALLURGY PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION SURGERY TESTING
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Beschreibung
Zusammenfassung:	The NH3 plasma treatment by remote plasma is firstly proposed to replace the covalent bonding process during surface modification procedure that for amine bond generation.