Photosensitive polymer composition, manufacturing method of pattern and electronic part

A photosensitive polymer composition is provided, containing: (a) polyamide having repeated units as shown in formula (I), (b) a compound for generating acid by light, and (c) a compound as shown in formula (II). (U is an organic group with 4 valence, V is an organic group with 2 valence, and p is a...

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Bibliographische Detailangaben
Hauptverfasser:	TSUMARU, YOSHIKO, KOMATSU, HIROSHI, OOE, MASAYUKI, KAWASAKI, DAI, UENO, TAKUMI, KATOU, KOUJI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS
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Beschreibung
Zusammenfassung:	A photosensitive polymer composition is provided, containing: (a) polyamide having repeated units as shown in formula (I), (b) a compound for generating acid by light, and (c) a compound as shown in formula (II). (U is an organic group with 4 valence, V is an organic group with 2 valence, and p is an integer of the number of the repeated units) (m and n are an integer of 1 or 2, respectively, R are hydrogen, alkyl group or acetyl group, respectively, and R1 and R2 are fluoroalkyl group having 1 to 3 carbon, respectively.)