Fabrication method for fabricating identification symbols and mask used therein

A fabrication method for fabricating a solar cell and a mask used to fabricate a screen plate of a solar cell are provided. The mask includes a main mask and at least one auxiliary mask. The main mask has a main pattern and at least one transparent combination region. The main pattern corresponds to...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	KUO, YINNG, TU, CHING-HAO, LIN, KANGNG, CHANG, KUO-FONG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGYGENERATION, TRANSMISSION OR DISTRIBUTION SEMICONDUCTOR DEVICES TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A fabrication method for fabricating a solar cell and a mask used to fabricate a screen plate of a solar cell are provided. The mask includes a main mask and at least one auxiliary mask. The main mask has a main pattern and at least one transparent combination region. The main pattern corresponds to a conducting layer of a solar cell. The auxiliary mask has an auxiliary pattern, wherein the auxiliary pattern corresponds to predetermined identification symbols of the solar cell, and the auxiliary mask is disposed in the combination region of the main mask so as to form a combination mask. In the fabrication method, the main mask and the auxiliary mask are firstly provided. Thereafter, the main mask and the auxiliary mask are combined. Then, the combination mask is used to perform a photolithography step on the screen plate so as to transfer the main pattern and the auxiliary pattern to the screen plate. Thereafter, the screen plate is used to print the conducting layer and the identification symbol.