Exposure apparatus and exposure method

An exposure method and an apparatus using the method are provided for forming a plurality of different alignment fields without using masks. By using linear polarization optical beams emitted from a light irradiation device(20) in a slanting direction to perform scan on a base board(1), the feature,...

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Bibliographische Detailangaben
Hauptverfasser:	UEHARA, SATOSHI, NEMOTO, RYOUJI, KAMAISHI, TAKAO, HATAKEYAMA, MICHIKO, KATAOKA, FUMIO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	An exposure method and an apparatus using the method are provided for forming a plurality of different alignment fields without using masks. By using linear polarization optical beams emitted from a light irradiation device(20) in a slanting direction to perform scan on a base board(1), the feature, i.e. the liquid-crystal's uniform alignment direction, is applied to the alignment film spread on the base board(1). A plurality of illumination optical systems are installed in this light irradiation device. These systems provide optical beams having different angles of incidence to a spatial light modulator(25) to modulate angles, and thereby let the optical beams emitted from a radiating optical system(26a, 26b) to the base board supported by a chuck.