Additive for alkaline etching solutions, in particular for texture etching solutions, and process for producing it
Product (56) obtainable by mixing (10; 20) at least one polyethylene glycol with a base to form a single-phase mixture (52), heating (12; 22) of the single-phase mixture (52) to a temperature of 80 DEG C and allowing the single-phase mixture (52) to rest (14) in ambient air until the single-phase mi...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | Product (56) obtainable by mixing (10; 20) at least one polyethylene glycol with a base to form a single-phase mixture (52), heating (12; 22) of the single-phase mixture (52) to a temperature of 80 DEG C and allowing the single-phase mixture (52) to rest (14) in ambient air until the single-phase mixture (52) changes colour, and also a process for the production of the product (56) and use of the product (56). |
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