Process Chamber liner with apertures for particle containment

An apparatus for use within a process Chamber is provided. The apparatus includes a liner adapted to cover the sidewalls of the process Chamber, with apertures corresponding to various inlets and outlets in the process Chamber. In addition, the liner has one or more apertures on its bottom surface, which allow particles to pass through the liner. The liner is designed to be shorter in height than the sidewalls of the process Chamber. This allows the liner to be placed within the Chamber such that its bottom surface is above the floor of the process Chamber. This minimizes the possibility of particles that have fallen onto the process Chamber floor becoming re-suspended at a later time. According to a second aspect of the disclosure, a bottom liner is provided. This liner can be used in conjunction with a conventional liner or in a process Chamber without a liner.