Platen to control charge accumulation

An embossed platen to control charge accumulation includes a dielectric layer, a plurality of embossments on a surface of the dielectric layer to support a workpiece, each of a first plurality of the plurality of embossments having a conductive portion to contact a backside of the workpiece when the...

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Bibliographische Detailangaben
Hauptverfasser: STONE, DALE K, SUURONEN, DAVID E, BLAKE, JULIAN G, AMMON, FREDERICK B, STONE, LYUDMILA
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:An embossed platen to control charge accumulation includes a dielectric layer, a plurality of embossments on a surface of the dielectric layer to support a workpiece, each of a first plurality of the plurality of embossments having a conductive portion to contact a backside of the workpiece when the workpiece is in a clamped position, and a conductor to electrically couple the conductive portion of the first plurality of embossments to ground. An ion implanter having such an embossed platen is also provided.