Scatterometer method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

A scatterometer for measuring a property of a substrate includes a focus sensing arrangement including an arrangement that directs a first beam of radiation onto a focusing arrangement, to be detected by a focus sensor arrangement. A focus controller provides control signals representative of the re...

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Bibliographische Detailangaben
Hauptverfasser:	VAN ASTEN, NICOLAAS ANTONIUS ALLEGONDUS JOHANNES, TIMMERMANS, JOHANNES CORNELIS MARIA, VAN BOXMEER, JOHAN MARIA, SINKE, ARNOLD, TAS, MARNIX, VAN POMMEREN, JASCHA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING
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Beschreibung
Zusammenfassung:	A scatterometer for measuring a property of a substrate includes a focus sensing arrangement including an arrangement that directs a first beam of radiation onto a focusing arrangement, to be detected by a focus sensor arrangement. A focus controller provides control signals representative of the relative positions of the focusing arrangement and the substrate, which are required to focus the first beam of radiation on the substrate. An actuator arrangement adjusts the position of the focusing arrangement dependent on the control signals. An irradiation arrangement directs a second beam of radiation onto the substrate using the focusing arrangement, a measurement detector detecting the second radiation beam after reflection from the substrate. A focus offset arrangement adjusts the focus produced by the focusing arrangement to compensate for an offset between the focusing of the first beam of radiation and the second beam of radiation.