A lithographic apparatus, a method of controlling the apparatus and a device manufacturing method

A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area...

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Bibliographische Detailangaben
Hauptverfasser:	RIEPEN, MICHEL, SHULEPOV, SERGEI, MULKENS, JOHANNES CATHARINUS HUBERTUS, MA, ZHEN-HUA, EVANGELISTA, FABRIZIO, BESSEMS, DAVID, EUMMELEN, ERIK HENRICUS EGIDIUS CATHARINA, STAVENGA, MARCO KOERT, WITBERG, ERIK, CROMWIJK, JAN WILLEM, KEMPER, NICOLAAS RUDOLF, GUNTER, PIETER LEIN JOSEPH, BRANDS, GERT-JAN GERARDUS JOHANNES THOMAS, JOSEN, MARINUS, MEIJERS, RALPH JOSEPH, BELL, FRANCISCUS WILHELMUS, LEENDERS, MARTINUS HENDRIKUS ANTONIUS, LIEBREGTS, PAULUS MARTINUS MARIA, MOERMAN, RICHARD, SMITS, MARCUS AGNES JOHANNES, LI, HUA, STEFFENS, KOEN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.