Method and device for coating planar substrates with chalcogens
The invention relates to a method and a device for coating planar substrates with chalcogens in the form of thin layers. The invention is intended to provide a fast and cost-effective coating of planar substrates with chalcogens, with a controlled and safe removal of the uncondensed chalcogen and a...
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| creator | LENZ, REINHARD SCHMID, DIETER BAIER, JORG HARTUNG, ROBERT MICHAEL KOTSCHAU, IMMO |
| description | The invention relates to a method and a device for coating planar substrates with chalcogens in the form of thin layers. The invention is intended to provide a fast and cost-effective coating of planar substrates with chalcogens, with a controlled and safe removal of the uncondensed chalcogen and a device suitable for carrying out the method. This is achieved by forming an inlet side and outlet side gas lock (6, 7) for the oxygen-tight closure of a process chamber (5), introducing one or more substrates to be coated, said substrates being temperature-regulated to a predetermined temperature, into the process chamber (5), introducing a chalcogen vapour/carrier gas mixture into the process chamber (5) which has a transport channel (4), above the substrates, forming a flow of the chalcogen vapour/carrier gas mixture through the transport channel (4) between the inlet side and outlet side gas locks (6, 7) and forming a chalcogen layer on the substrates by means of PVD during a predetermined dwell time and removin |
| format | Patent |
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The invention is intended to provide a fast and cost-effective coating of planar substrates with chalcogens, with a controlled and safe removal of the uncondensed chalcogen and a device suitable for carrying out the method. This is achieved by forming an inlet side and outlet side gas lock (6, 7) for the oxygen-tight closure of a process chamber (5), introducing one or more substrates to be coated, said substrates being temperature-regulated to a predetermined temperature, into the process chamber (5), introducing a chalcogen vapour/carrier gas mixture into the process chamber (5) which has a transport channel (4), above the substrates, forming a flow of the chalcogen vapour/carrier gas mixture through the transport channel (4) between the inlet side and outlet side gas locks (6, 7) and forming a chalcogen layer on the substrates by means of PVD during a predetermined dwell time and removin</description><language>chi ; eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2010</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20101101&DB=EPODOC&CC=TW&NR=201038756A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76418</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20101101&DB=EPODOC&CC=TW&NR=201038756A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LENZ, REINHARD</creatorcontrib><creatorcontrib>SCHMID, DIETER</creatorcontrib><creatorcontrib>BAIER, JORG</creatorcontrib><creatorcontrib>HARTUNG, ROBERT MICHAEL</creatorcontrib><creatorcontrib>KOTSCHAU, IMMO</creatorcontrib><title>Method and device for coating planar substrates with chalcogens</title><description>The invention relates to a method and a device for coating planar substrates with chalcogens in the form of thin layers. 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This is achieved by forming an inlet side and outlet side gas lock (6, 7) for the oxygen-tight closure of a process chamber (5), introducing one or more substrates to be coated, said substrates being temperature-regulated to a predetermined temperature, into the process chamber (5), introducing a chalcogen vapour/carrier gas mixture into the process chamber (5) which has a transport channel (4), above the substrates, forming a flow of the chalcogen vapour/carrier gas mixture through the transport channel (4) between the inlet side and outlet side gas locks (6, 7) and forming a chalcogen layer on the substrates by means of PVD during a predetermined dwell time and removin</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2010</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLD3TS3JyE9RSMxLUUhJLctMTlVIyy9SSM5PLMnMS1coyEnMSyxSKC5NKi4pSixJLVYozyzJUEjOSMxJzk9PzSvmYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxIeFGBoYGxhbmpmaOxsSoAQCPiTEr</recordid><startdate>20101101</startdate><enddate>20101101</enddate><creator>LENZ, REINHARD</creator><creator>SCHMID, DIETER</creator><creator>BAIER, JORG</creator><creator>HARTUNG, ROBERT MICHAEL</creator><creator>KOTSCHAU, IMMO</creator><scope>EVB</scope></search><sort><creationdate>20101101</creationdate><title>Method and device for coating planar substrates with chalcogens</title><author>LENZ, REINHARD ; SCHMID, DIETER ; BAIER, JORG ; HARTUNG, ROBERT MICHAEL ; KOTSCHAU, IMMO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW201038756A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2010</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>LENZ, REINHARD</creatorcontrib><creatorcontrib>SCHMID, DIETER</creatorcontrib><creatorcontrib>BAIER, JORG</creatorcontrib><creatorcontrib>HARTUNG, ROBERT MICHAEL</creatorcontrib><creatorcontrib>KOTSCHAU, IMMO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LENZ, REINHARD</au><au>SCHMID, DIETER</au><au>BAIER, JORG</au><au>HARTUNG, ROBERT MICHAEL</au><au>KOTSCHAU, IMMO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method and device for coating planar substrates with chalcogens</title><date>2010-11-01</date><risdate>2010</risdate><abstract>The invention relates to a method and a device for coating planar substrates with chalcogens in the form of thin layers. 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| language | chi ; eng |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | Method and device for coating planar substrates with chalcogens |
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