Method and device for coating planar substrates with chalcogens

The invention relates to a method and a device for coating planar substrates with chalcogens in the form of thin layers. The invention is intended to provide a fast and cost-effective coating of planar substrates with chalcogens, with a controlled and safe removal of the uncondensed chalcogen and a device suitable for carrying out the method. This is achieved by forming an inlet side and outlet side gas lock (6, 7) for the oxygen-tight closure of a process chamber (5), introducing one or more substrates to be coated, said substrates being temperature-regulated to a predetermined temperature, into the process chamber (5), introducing a chalcogen vapour/carrier gas mixture into the process chamber (5) which has a transport channel (4), above the substrates, forming a flow of the chalcogen vapour/carrier gas mixture through the transport channel (4) between the inlet side and outlet side gas locks (6, 7) and forming a chalcogen layer on the substrates by means of PVD during a predetermined dwell time and removin