Application of benzocyclobutene for imprint technique and pattern forming method by the technique

Disclosed is a method for forming a pattern of a benzocyclobutene resin by using a thermal imprint lithography technique. Specifically disclosed is a method for forming a pattern by imprinting, which comprises: a step wherein a layer containing a benzocyclobutene resin that is obtained by polymerizi...

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Bibliographische Detailangaben
Hauptverfasser:	AOBA, KAZUHIRO, KATAYAMA, JUNKO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MATERIALS THEREFOR MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES METALLURGY NANOTECHNOLOGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Beschreibung
Zusammenfassung:	Disclosed is a method for forming a pattern of a benzocyclobutene resin by using a thermal imprint lithography technique. Specifically disclosed is a method for forming a pattern by imprinting, which comprises: a step wherein a layer containing a benzocyclobutene resin that is obtained by polymerizing divinylsiloxane-bisbenzocyclobutene is formed on a substrate; a step wherein a mold is pressed against the layer containing a benzocyclobutene resin while being heated and pressurized, so that a pattern is formed in the layer containing a benzocyclobutene resin; and a step wherein the layer containing a benzocyclobutene resin is released from the mold after being cooled, said layer having been provided with the pattern. In the method for forming a pattern by imprinting, the heating temperature is within the range of 150-350 DEG C.