Vacuum pumping device, vacuum processing device, and vacuum processing method

Provided are a vacuum pumping device, a vacuum processing device, and a vacuum pumping method capable of preventing accumulation of ozone in a cryopump. A vacuum processing device (1) pertaining to an embodiment of the invention is equipped with a processing chamber (11) for vacuum processing, a pum...

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Bibliographische Detailangaben
Hauptverfasser:	MASUDA, YUKIO, FURUYA, SHINJI, KOMURO, TAKU, SAITO, KAZUYA, ASARI, SHIN, OSONO, SHUJI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BLASTING HEATING LIGHTING MECHANICAL ENGINEERING POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS PUMPS FOR LIQUIDS OR ELASTIC FLUIDS WEAPONS
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Beschreibung
Zusammenfassung:	Provided are a vacuum pumping device, a vacuum processing device, and a vacuum pumping method capable of preventing accumulation of ozone in a cryopump. A vacuum processing device (1) pertaining to an embodiment of the invention is equipped with a processing chamber (11) for vacuum processing, a pump unit for exhausting the processing chamber (11), and a heating unit (20). The pump unit has a cold trap (161) capable of collecting the exhaust gas and an exhaust pathway (13A) for leading the exhaust gas from the processing chamber (11) to the cold trap (161). The heating unit (20) pyrolyzes ozone contained in the exhaust gas while it is in the exhaust pathway (13A) on the way to the cold trap (161) from the processing chamber (11).