Method for forming fluid repellent bank structure

A method for forming a fluid repellent bank structure, using an liquid-repellent thin film forming process before or after photo-lithography to make the surface of the patterned photo-resist liquid-repellent. Due to the surface energy difference between the substrate and the photo-resist surfaces, t...

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Bibliographische Detailangaben
Hauptverfasser:	SUNG, CHAO-FENG, LU, JHIH-PING, LEE, YUH-ZHENG, HSU, CHENUN, CHEN, FU-KANG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A method for forming a fluid repellent bank structure, using an liquid-repellent thin film forming process before or after photo-lithography to make the surface of the patterned photo-resist liquid-repellent. Due to the surface energy difference between the substrate and the photo-resist surfaces, the droplets can be self-positioned without mixing with any other.