Lithographic apparatus and device manufacturing method
A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling...
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| creator | VAN DER ZANDEN, MARCUS JOHANNES BADAM, VIJAY KUMAR BRULS, RICHARD JOSEPH KNAAPEN, THIJS EGIDIUS JOHANNES PELLENS, RUDY JAN MARIA STAVENGA, MARCO KOERT KAMPHUIS, MARTIJN HENDRIK VERSPAGET, COEN CORNELIS WILHELMUS BRANDS, GERT-JAN GERARDUS JOHANNES THOMAS VAN DOMMELEN, YOURI JOHANNES LAURENTIUS MARIA JACOBS, JOHANNES HENRICUS WILHELMUS LIEBREGTS, PAULUS MARTINUS MARIA ANSTOTZ, DAVID LUCIEN DE GROOT, CASPER RODERIK VAN DER HOEVEN, JAN CORNELIS MAAS, RUDOLF ADRIANUS JOANNES |
| description | A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor. |
| format | Patent |
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| language | chi ; eng |
| recordid | cdi_epo_espacenet_TW201027275A |
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| subjects | ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Lithographic apparatus and device manufacturing method |
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