Lithographic apparatus and device manufacturing method

A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling...

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Bibliographische Detailangaben
Hauptverfasser:	VAN DER ZANDEN, MARCUS JOHANNES, BADAM, VIJAY KUMAR, BRULS, RICHARD JOSEPH, KNAAPEN, THIJS EGIDIUS JOHANNES, PELLENS, RUDY JAN MARIA, STAVENGA, MARCO KOERT, KAMPHUIS, MARTIJN HENDRIK, VERSPAGET, COEN CORNELIS WILHELMUS, BRANDS, GERT-JAN GERARDUS JOHANNES THOMAS, VAN DOMMELEN, YOURI JOHANNES LAURENTIUS MARIA, JACOBS, JOHANNES HENRICUS WILHELMUS, LIEBREGTS, PAULUS MARTINUS MARIA, ANSTOTZ, DAVID LUCIEN, DE GROOT, CASPER RODERIK, VAN DER HOEVEN, JAN CORNELIS, MAAS, RUDOLF ADRIANUS JOANNES
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.