Method for manufacturing transparent conductive oxide (TCO) films; properties and applications of such films

Method for manufacturing transparent conductive oxide (TCO) films; properties and applications of such films

A method for manufacturing a boron doped, transparent, conductive zinc oxide layer from on a substrate is disclosed. The layer is being deposited from at least diethylzinc, water and diborane by low pressure chemical vapour deposition (LPCVD) in a process chamber of a deposition system comprising wh...

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Bibliographische Detailangaben
Hauptverfasser: TEREN, ANDREW, BENAGLI, STEFANO, WATKINS, OWAN CHARLES, VOGLER, BENJAMIN, MEIER, JOHANNES, SCHNEIDER, STEFAN, BORRELLO, DANIEL, GOSSLA, MARIO, DIMITRY, ZIMIN, RAMOINO, LUCA, KERSCHBAUMER, JOERG, WIDER, JOACHIM, POPPELLER, MARKUS, KROLL, ULRICH, KUHN, HANSJOERG, ZINDEL, ARNO, MARK, ANDREAS, DESPONT, LAURENT, VALLAT-SAUVAIN, EVELYNE
Format: Patent
Sprache:chi ; eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
CABLES
CONDUCTORS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INSULATORS
SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:A method for manufacturing a boron doped, transparent, conductive zinc oxide layer from on a substrate is disclosed. The layer is being deposited from at least diethylzinc, water and diborane by low pressure chemical vapour deposition (LPCVD) in a process chamber of a deposition system comprising wherein the gas flow ratio of diethylzinc and water is kept between 0.87 and 1.3 and the gas flow ratio of diborane and diethylzinc is being kept between 0.05 and 0.4. The haze of such manufactured layer, measured as ratio of diffuse transmittance to total transmittance at 600 nm, is between 10 and 25%.