Antistatic block copolymer pressure sensitive adhesives and articles

An antistatic pressure sensitive adhesive composition, useful in electronic and optical display applications, comprising an antistatic agent and a first block copolymer comprising at least two hard A block polymeric units each independently having a Tg of at least 50 DEG C, and at least one soft B b...

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Bibliographische Detailangaben
Hauptverfasser:	XIA, JIAN-HUI, JOSEPH, EUGENE GREGORY, TSE, KIU-YUEN, BHARTI, VIVEK, SATRIJO, ANDREW, EVERAERTS, ALBERT IVO, PURGETT, MARK DODD, YOON, WANSHIK
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE ADHESIVES CHEMISTRY DYES METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL PAINTS POLISHES USE OF MATERIALS AS ADHESIVES
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Beschreibung
Zusammenfassung:	An antistatic pressure sensitive adhesive composition, useful in electronic and optical display applications, comprising an antistatic agent and a first block copolymer comprising at least two hard A block polymeric units each independently having a Tg of at least 50 DEG C, and at least one soft B block (meth)acrylic polymeric unit having a Tg no greater than 20 DEG C. The composition can comprise a second block copolymer. Articles comprising an antistatic pressure sensitive adhesive composition adjacent a first surface of a substrate.