Apparatus and process for producing photopolymer sheet

Disclosed is a photosensitive resin plate sheet manufacturing apparatus, in which two upper and lower supporting substrates face each other to form a clearance for arranging a photosensitive resin, in which at least one of the supporting substrates is a transparent substrate for transmitting an acti...

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Bibliographische Detailangaben
Hauptverfasser:	BAE, HONG-GI, KAWAMOTO, TADASHI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY LINING MACHINES MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTING PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES STAMPS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF TRANSPORTING TYPEWRITERS
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Beschreibung
Zusammenfassung:	Disclosed is a photosensitive resin plate sheet manufacturing apparatus, in which two upper and lower supporting substrates face each other to form a clearance for arranging a photosensitive resin, in which at least one of the supporting substrates is a transparent substrate for transmitting an active beam, and in which one of the supporting substrates has its inner face roughened so that a liquid photosensitive resin is hardened by causing the liquid photosensitive resin to contact the rough face and by irradiating the same with the active beam through the transparent substrate. The photosensitive resin plate sheet manufacturing apparatus includes a clearance adjusting mechanism for adjusting the clearance by moving at least one of the two upper and lower supporting substrates upward and downward. In the printing plate for a liquid crystal orienting film required to have thin film printability of a high precision without any pin hole. The apparatus and method for manufacturing a photosensitive resin printing