Transfer robot for spinner system, transport hand thereof and vacuum supply apparatus thereof

The present invention is used to reduce the amount of heat conducted from high temperature generated by a transport hand that is heated as moving in and out of a high temperature environment toward a wafer that is being conveyed by the transport hand so as to effectively preventing the wafer from ge...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: LEE, JUNE-HYEONG, RYU, JAI-MOON, KIM, CHANG-HYEON
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The present invention is used to reduce the amount of heat conducted from high temperature generated by a transport hand that is heated as moving in and out of a high temperature environment toward a wafer that is being conveyed by the transport hand so as to effectively preventing the wafer from getting a high temperature due to being heated by the amount of heat conducted. The present invention provides a transfer robot for spinner system, a transport hand, and a vacuum supply apparatus that prevents any one of a plurality of transport hands from abrupt reduction of vacuum suction pressure even when the transport hands are each sucking and holding a wafer to thereby simultaneously consume vacuum.