Transfer robot for spinner system, transport hand thereof and vacuum supply apparatus thereof
The present invention is used to reduce the amount of heat conducted from high temperature generated by a transport hand that is heated as moving in and out of a high temperature environment toward a wafer that is being conveyed by the transport hand so as to effectively preventing the wafer from ge...
Gespeichert in:
Hauptverfasser: | , , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The present invention is used to reduce the amount of heat conducted from high temperature generated by a transport hand that is heated as moving in and out of a high temperature environment toward a wafer that is being conveyed by the transport hand so as to effectively preventing the wafer from getting a high temperature due to being heated by the amount of heat conducted. The present invention provides a transfer robot for spinner system, a transport hand, and a vacuum supply apparatus that prevents any one of a plurality of transport hands from abrupt reduction of vacuum suction pressure even when the transport hands are each sucking and holding a wafer to thereby simultaneously consume vacuum. |
---|