Lithographic apparatus and device manufacturing method

A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The apparatus also includes a barrier member, surrounding a space between the projection system and, in use, the substrate, to define in part with the projecti...

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Bibliographische Detailangaben

Hauptverfasser:	VAN DE KERKHOF, MARCUS ADRIANUS, THOMAS, IVO ADAM JOHANNES, LANDHEER, SIEBE, BRUIJSTENS, JEROEN PETER JOHANNES, VAN OERLE, BARTHOLOMEUS MATHIAS, JANSSEN, FRANCISCUS JOHANNES JOSEPH, BECKERS, MARCEL, MAAS, WOUTERUS JOHANNES PETRUS MARIA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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