Lithographic apparatus and device manufacturing method

A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The apparatus also includes a barrier member, surrounding a space between the projection system and, in use, the substrate, to define in part with the projecti...

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Hauptverfasser: VAN DE KERKHOF, MARCUS ADRIANUS, THOMAS, IVO ADAM JOHANNES, LANDHEER, SIEBE, BRUIJSTENS, JEROEN PETER JOHANNES, VAN OERLE, BARTHOLOMEUS MATHIAS, JANSSEN, FRANCISCUS JOHANNES JOSEPH, BECKERS, MARCEL, MAAS, WOUTERUS JOHANNES PETRUS MARIA
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The apparatus also includes a barrier member, surrounding a space between the projection system and, in use, the substrate, to define in part with the projection system a reservoir for liquid. A radially outer surface of the barrier member facing a portion of projection system and a radially outer surface of the portion of the projection system facing the barrier member each have a liquidphobic outer surface. The liquidphobic outer surface of the barrier member and/or the liquidphobic outer surface of the portion of the projection system has an inner edge that defines in part the reservoir.