Lithographic apparatus and device manufacturing method
A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The apparatus also includes a barrier member, surrounding a space between the projection system and, in use, the substrate, to define in part with the projecti...
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| creator | VAN DE KERKHOF, MARCUS ADRIANUS THOMAS, IVO ADAM JOHANNES LANDHEER, SIEBE BRUIJSTENS, JEROEN PETER JOHANNES VAN OERLE, BARTHOLOMEUS MATHIAS JANSSEN, FRANCISCUS JOHANNES JOSEPH BECKERS, MARCEL MAAS, WOUTERUS JOHANNES PETRUS MARIA |
| description | A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The apparatus also includes a barrier member, surrounding a space between the projection system and, in use, the substrate, to define in part with the projection system a reservoir for liquid. A radially outer surface of the barrier member facing a portion of projection system and a radially outer surface of the portion of the projection system facing the barrier member each have a liquidphobic outer surface. The liquidphobic outer surface of the barrier member and/or the liquidphobic outer surface of the portion of the projection system has an inner edge that defines in part the reservoir. |
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The apparatus also includes a barrier member, surrounding a space between the projection system and, in use, the substrate, to define in part with the projection system a reservoir for liquid. A radially outer surface of the barrier member facing a portion of projection system and a radially outer surface of the portion of the projection system facing the barrier member each have a liquidphobic outer surface. The liquidphobic outer surface of the barrier member and/or the liquidphobic outer surface of the portion of the projection system has an inner edge that defines in part the reservoir.</description><language>chi ; eng</language><subject>ACCESSORIES THEREFOR ; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES ; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2009</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20090416&DB=EPODOC&CC=TW&NR=200916977A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20090416&DB=EPODOC&CC=TW&NR=200916977A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>VAN DE KERKHOF, MARCUS ADRIANUS</creatorcontrib><creatorcontrib>THOMAS, IVO ADAM JOHANNES</creatorcontrib><creatorcontrib>LANDHEER, SIEBE</creatorcontrib><creatorcontrib>BRUIJSTENS, JEROEN PETER JOHANNES</creatorcontrib><creatorcontrib>VAN OERLE, BARTHOLOMEUS MATHIAS</creatorcontrib><creatorcontrib>JANSSEN, FRANCISCUS JOHANNES JOSEPH</creatorcontrib><creatorcontrib>BECKERS, MARCEL</creatorcontrib><creatorcontrib>MAAS, WOUTERUS JOHANNES PETRUS MARIA</creatorcontrib><title>Lithographic apparatus and device manufacturing method</title><description>A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. 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| language | chi ; eng |
| recordid | cdi_epo_espacenet_TW200916977A |
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| subjects | ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Lithographic apparatus and device manufacturing method |
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