Coating-developing apparatus, operational method for coating-developing apparatus and storage medium

Disclosed is the technology that can retrieve the substrate where the protective film is not coated properly without adverse effect to the normal substrate and can simplify the removal work of the protective film in the coating-developing apparatus applied to the immersion exposure. The coating-deve...

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Bibliographische Detailangaben
Hauptverfasser:	KANEKO, TOMOHIRO, SHIN, TOMONORI, MIYATA, AKIRA, OKAMURA, KOUJI, FUJIMARU, SYUZO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	Disclosed is the technology that can retrieve the substrate where the protective film is not coated properly without adverse effect to the normal substrate and can simplify the removal work of the protective film in the coating-developing apparatus applied to the immersion exposure. The coating-developing apparatus of this invention controls the transportation of the substrate as follows. The abnormal substrate to which the protective film is not coated properly for the immersion exposure stands by the standby module without being carried into the exposure part. After the substrate whose order one is less than the abnormal substrate is carried out of the exposure part and is carried into a specified module, for instance the heating module, before developing, the abnormal substrate is carried into a specified module. This control makes it not influence so-called schedule transportation, and executes processing of an abnormal substrate with the protective film removal unit.