Substrate-supporting mechanism

Provided is a substrate-supporting mechanism capable of realizing high speed transportation of substrate and ensuring appropriate transportation movements. Holders 15 made of carbon nano-tube are provided on a supporting surface 14a of an end effector 14, and a substrate W is supported by front ends...

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Bibliographische Detailangaben
Hauptverfasser: KAWAGUCHI, TAKAFUMI, NAKANO, HARUHISA, EGAMI, YOUICHI, MUSHA, KAZUHIRO, MINAMI, HIROFUMI, MURAKAMI, HIROHIKO
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:Provided is a substrate-supporting mechanism capable of realizing high speed transportation of substrate and ensuring appropriate transportation movements. Holders 15 made of carbon nano-tube are provided on a supporting surface 14a of an end effector 14, and a substrate W is supported by front ends of the carbon nano-tubes. In this moment, an inter-molecular force occurs between the substrate and the carbon nano-tubes, and the substrate is supported on the supporting surface while being provided with a certain adhesion force with respect to the supporting surface. This adhesion force occurs both in atmosphere and vacuum, and is bigger as the number of the carbon nano-tubes per unit area increases. By the afore-mentioned configuration, slippage of object to be transported on the supporting surface can be efficiently restricted, and high speed transportation of substrate can be realized. Moreover, since the carbon nano-tube has excellent thermal resistance, it is possible to avoid deterioration of the supporte