Lithographic apparatus having encoder type position sensor system
A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the...
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| creator | EUSSEN, EMIEL JOZEF MELANIE BEERENS, RUUD ANTONIUS CATHARINA MARIA SMITS, ALBERTUS ADRIANUS BOX, WILHELMUS JOSEPHUS LOOPSTRA, ERIK ROELOF STEIJAERT, PETER PAUL VAN DER PASCH, ENGELBERTUS ANTONIUS FRANSISCUS |
| description | A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TW200905413A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TW200905413A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TW200905413A3</originalsourceid><addsrcrecordid>eNqNyrEKwkAMANBbHET9h_gBwml16FhEcXAsOJZwxt6BJuEShf69ix_g9JY3D921eJaxouaSAFWxor8NMn4Kj0Cc5E4VfFICFStehMGITSrYZE6vZZg98Gm0-rkI6_OpP142pDKQKSZi8qG_7WJs42G_bbrmn_MFcLkyrg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Lithographic apparatus having encoder type position sensor system</title><source>esp@cenet</source><creator>EUSSEN, EMIEL JOZEF MELANIE ; BEERENS, RUUD ANTONIUS CATHARINA MARIA ; SMITS, ALBERTUS ADRIANUS ; BOX, WILHELMUS JOSEPHUS ; LOOPSTRA, ERIK ROELOF ; STEIJAERT, PETER PAUL ; VAN DER PASCH, ENGELBERTUS ANTONIUS FRANSISCUS</creator><creatorcontrib>EUSSEN, EMIEL JOZEF MELANIE ; BEERENS, RUUD ANTONIUS CATHARINA MARIA ; SMITS, ALBERTUS ADRIANUS ; BOX, WILHELMUS JOSEPHUS ; LOOPSTRA, ERIK ROELOF ; STEIJAERT, PETER PAUL ; VAN DER PASCH, ENGELBERTUS ANTONIUS FRANSISCUS</creatorcontrib><description>A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2009</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20090201&DB=EPODOC&CC=TW&NR=200905413A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20090201&DB=EPODOC&CC=TW&NR=200905413A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>EUSSEN, EMIEL JOZEF MELANIE</creatorcontrib><creatorcontrib>BEERENS, RUUD ANTONIUS CATHARINA MARIA</creatorcontrib><creatorcontrib>SMITS, ALBERTUS ADRIANUS</creatorcontrib><creatorcontrib>BOX, WILHELMUS JOSEPHUS</creatorcontrib><creatorcontrib>LOOPSTRA, ERIK ROELOF</creatorcontrib><creatorcontrib>STEIJAERT, PETER PAUL</creatorcontrib><creatorcontrib>VAN DER PASCH, ENGELBERTUS ANTONIUS FRANSISCUS</creatorcontrib><title>Lithographic apparatus having encoder type position sensor system</title><description>A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2009</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyrEKwkAMANBbHET9h_gBwml16FhEcXAsOJZwxt6BJuEShf69ix_g9JY3D921eJaxouaSAFWxor8NMn4Kj0Cc5E4VfFICFStehMGITSrYZE6vZZg98Gm0-rkI6_OpP142pDKQKSZi8qG_7WJs42G_bbrmn_MFcLkyrg</recordid><startdate>20090201</startdate><enddate>20090201</enddate><creator>EUSSEN, EMIEL JOZEF MELANIE</creator><creator>BEERENS, RUUD ANTONIUS CATHARINA MARIA</creator><creator>SMITS, ALBERTUS ADRIANUS</creator><creator>BOX, WILHELMUS JOSEPHUS</creator><creator>LOOPSTRA, ERIK ROELOF</creator><creator>STEIJAERT, PETER PAUL</creator><creator>VAN DER PASCH, ENGELBERTUS ANTONIUS FRANSISCUS</creator><scope>EVB</scope></search><sort><creationdate>20090201</creationdate><title>Lithographic apparatus having encoder type position sensor system</title><author>EUSSEN, EMIEL JOZEF MELANIE ; BEERENS, RUUD ANTONIUS CATHARINA MARIA ; SMITS, ALBERTUS ADRIANUS ; BOX, WILHELMUS JOSEPHUS ; LOOPSTRA, ERIK ROELOF ; STEIJAERT, PETER PAUL ; VAN DER PASCH, ENGELBERTUS ANTONIUS FRANSISCUS</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW200905413A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2009</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>EUSSEN, EMIEL JOZEF MELANIE</creatorcontrib><creatorcontrib>BEERENS, RUUD ANTONIUS CATHARINA MARIA</creatorcontrib><creatorcontrib>SMITS, ALBERTUS ADRIANUS</creatorcontrib><creatorcontrib>BOX, WILHELMUS JOSEPHUS</creatorcontrib><creatorcontrib>LOOPSTRA, ERIK ROELOF</creatorcontrib><creatorcontrib>STEIJAERT, PETER PAUL</creatorcontrib><creatorcontrib>VAN DER PASCH, ENGELBERTUS ANTONIUS FRANSISCUS</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>EUSSEN, EMIEL JOZEF MELANIE</au><au>BEERENS, RUUD ANTONIUS CATHARINA MARIA</au><au>SMITS, ALBERTUS ADRIANUS</au><au>BOX, WILHELMUS JOSEPHUS</au><au>LOOPSTRA, ERIK ROELOF</au><au>STEIJAERT, PETER PAUL</au><au>VAN DER PASCH, ENGELBERTUS ANTONIUS FRANSISCUS</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Lithographic apparatus having encoder type position sensor system</title><date>2009-02-01</date><risdate>2009</risdate><abstract>A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Lithographic apparatus having encoder type position sensor system |
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