Lithographic apparatus having encoder type position sensor system

Lithographic apparatus having encoder type position sensor system

A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: EUSSEN, EMIEL JOZEF MELANIE, BEERENS, RUUD ANTONIUS CATHARINA MARIA, SMITS, ALBERTUS ADRIANUS, BOX, WILHELMUS JOSEPHUS, LOOPSTRA, ERIK ROELOF, STEIJAERT, PETER PAUL, VAN DER PASCH, ENGELBERTUS ANTONIUS FRANSISCUS
Format: Patent
Sprache:chi ; eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.