Colored photosensitive composition for correction of defect and color filter

To provide a polymer-free colored photosensitive composition for correction of minute colored pattern defects having properties required to correct minute colored pattern defects in a well-balanced state. The colored photosensitive composition used for correcting minute colored pattern defects in a...

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Bibliographische Detailangaben
Hauptverfasser:	TAKANO, KAZUMI, MIYAZATO, RYOUKO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	To provide a polymer-free colored photosensitive composition for correction of minute colored pattern defects having properties required to correct minute colored pattern defects in a well-balanced state. The colored photosensitive composition used for correcting minute colored pattern defects in a color filter substrate with a colored layer formed on a substrate contains at least a pigment, an organic solvent and a polyfunctional acrylate monomer without containing a polymer, wherein the polyfunctional acrylate monomer contains a monomer having a soft segment.