Method for revising/repairing a projection objective of a lithography projection expose apparatus and such projection objective

A method for revising/repairing a projection objective of a lithography projection exposure apparatus, the projection objective comprising a plurality of optical elements between an object plane and an image plane, the plurality of optical elements comprising at least one first optical element havin...

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Bibliographische Detailangaben
Hauptverfasser:	HAEUSSLER, JOCHEN, PETASCH, THOMAS, ROGALSKY, OLAF, BITTNER, BORIS
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A method for revising/repairing a projection objective of a lithography projection exposure apparatus, the projection objective comprising a plurality of optical elements between an object plane and an image plane, the plurality of optical elements comprising at least one first optical element having a refractive power, comprises, without exchanging all of the optical elements, removing the at least one first optical element from the projection objective in the field, inserting at least one first spare optical element into the projection objective at the location of the at least one first optical element, and adjusting an image quality of the projection objective to a desired quality.