A substrate processing device, a substrate processing method and a production method for a substrate

A substrate processing device, a substrate processing method and a production method for a substrate are provided in this present invention. A drug liquid processing of an inclined substrate is uniformly performed under the condition that, on the one hand, the substrate is kept in an inclined state,...

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Bibliographische Detailangaben
Hauptverfasser:	KAMAISHI, TAKAO, MORIGUCHI, YOSHIHIRO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FREQUENCY-CHANGING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	A substrate processing device, a substrate processing method and a production method for a substrate are provided in this present invention. A drug liquid processing of an inclined substrate is uniformly performed under the condition that, on the one hand, the substrate is kept in an inclined state, and, on the other hand, the drug liquid with a temperature higher than a normal temperature is used. When the substrate 1 passes beneath a heater 11, the heater 11 heats the surface of the substrate 1 to a temperature close to the temperature of the drug liquid supplied by a drug liquid nozzle 21. The drug liquid nozzle 21 supplies the drug liquid, whose temperature is higher than a normal temperature, towards the surface of the substrate 1. By means of the drug liquid supplied to the surface of the substrate 1, the drug liquid processing on the surface of the substrate 1 is performed. Before the drug liquid processing of the substrate 1 is performed, the substrate 1 is heated to a temperature close to the tempera