Method of manufacturing Al and Al alloy sputtering target

A method of manufacture sputtering target is disclosed. This method uses direct-chill casting technique to manufacture various kinds of Al and Al alloy ingots. The Al alloy ingots cast can be cut directly into the desired sputtering target of Al and Al alloy without the follow up forging process. Th...

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Bibliographische Detailangaben
Hauptverfasser:	LUO, REN AN, HSU, POUN, PENG, CHIA-HSIANG, TSENG, FAN CHUN, TORNG, SHAN, YANG, CHUNEING, CHEN, SHIH-YING
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CASTING CASTING OF METALS CASTING OF OTHER SUBSTANCES BY THE SAME PROCESSES OR DEVICES CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS POWDER METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING
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Beschreibung
Zusammenfassung:	A method of manufacture sputtering target is disclosed. This method uses direct-chill casting technique to manufacture various kinds of Al and Al alloy ingots. The Al alloy ingots cast can be cut directly into the desired sputtering target of Al and Al alloy without the follow up forging process. This method provides advantages of less engineering process required, higher production, and higher yield of qualified products. Furthermore, the sputtering target product has the advantage of less grain size, tiny educt material, and uniformity composition.