Etching solution for liquid crystal polymer and method for etching liquid crystal polymer

The invention provides an etching solution suitably using in the formation of a device hole, via hole and the like on a substrate of liquid crystal polymer by etching process; and a etching method of using thereof. An etching solution for liquid crystal polymer is characterized in it is a solution comprises 30 wt% or more to 35 wt% or less of inorganic alkali compound such as alkali metal hydroxide and the like, 45 to 50 wt% of aliphatic amino alcohol having at least one or more amino group and hydroxyl group and water; and the concentration of total alkali component, (i.e. the total amount of inorganic alkali compound and amino alcohol), is 75 wt% to 80 wt% aqueous solution; as well as an etching is carried out by using the said etching solution and conducting contact with liquid crystal compound under the temperature of 60 DEG C or more to 90 DEG C or less of the solution.