Photoresist composition for positive liquid crystal device

This invention provides a photoresist composition for chemically amplified positive liquid crystal device, which is characterized by comprising (A) the polymer having the group represented by the following general formula (I), wherein R1, R2 and R3 are same or different, substituted or unsubstituted...

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Bibliographische Detailangaben
Hauptverfasser:	NUMAZAKI, RYO, MURAYAMA, TOSHIKAZU, KOMAI, MASATSUGU, KATO, YOSIYUKI, ITO, KATSUHIRO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	This invention provides a photoresist composition for chemically amplified positive liquid crystal device, which is characterized by comprising (A) the polymer having the group represented by the following general formula (I), wherein R1, R2 and R3 are same or different, substituted or unsubstituted alkyl, substituted or unsubstituted aryl etc., X is O or NR(wherein, R is hydrogen, substituted or unsubstituted alkyl, substituted or unsubstituted aryl, or substituted or unsubstituted aralkyl), (B) the compound capable of generating acid by irradiating with radiation, and (C) organic solvent.