A method of preparing components, prepared component, lithographic apparatus and device manufacturing method

A method of preparing components for use in the vacuum chamber of a lithographic apparatus is disclosed. The method comprises firstly coating the component with a non-metallic, non-plastics material then treating the coating so as to harden it. The preferred coating material is a Hydrogen Silsesquio...

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Bibliographische Detailangaben
Hauptverfasser:	VOORMA, HARM-JAN, KROON, MARK, SPEE, CAROLUS IDA MARIA ANTONIUS, DAMS, JOHANNES ADRIANUS ANTONIUS THEODORUS
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A method of preparing components for use in the vacuum chamber of a lithographic apparatus is disclosed. The method comprises firstly coating the component with a non-metallic, non-plastics material then treating the coating so as to harden it. The preferred coating material is a Hydrogen Silsesquioxane (HSQ) which can be applied using a variety of methods (spraying, brushing, spinning) and can be treated by either heating or by irradiation with an electron beam. The resulting components strongly reduce outgassing of either water or hydrocarbons when subjected to a vacuum environment.