Plasma-treated planar textile structures method for its production and applications

A plasma-treated planar textile structure containing synthetic fibers and a method for producing the structure, wherein the structure has a high initial wettability, expressed by a height of rise of at least 80 mm after immersion for 30 minutes in an aqueous potassium hydroxide solution, and, upon s...

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Bibliographische Detailangaben
Hauptverfasser: SEVERICH, BIRGIT, KRITZER, PETER, SCHOPPING, GERHARD, RUTZ, STEPHAN, HALLSTEIN, WOLFGANG
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:A plasma-treated planar textile structure containing synthetic fibers and a method for producing the structure, wherein the structure has a high initial wettability, expressed by a height of rise of at least 80 mm after immersion for 30 minutes in an aqueous potassium hydroxide solution, and, upon storage for three months in air at 25 DEG C, has a high initial wettability, expressed by a height of rise of at least 75 mm after immersion for 30 minutes in an aqueous potassium hydroxide solution. The plasma-treated planar textile structures preferably have a high hydrophilic stability when stored in alkaline media. The plasma-treated planar textile structures can be used, in particular, as separators for electrochemical energy storage devices.