Method and apparatus for manufacturing thin film

An electron beam evaporation source (42) that contains a first thin film material, an electron beam source (44) that emits an electron beam (45) to be used to evaporate the first thin film material by heating, and a resistance heating evaporation source (48) for evaporating a second thin film materi...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SAKAI, HITOSHI, HIGUCHI, HIROSHI, HONDA, KAZUYOSHI, ITOH, SYUUJI, INABA, JUNICHI, TAKAI, YORIKO, OKAZAKI, SADAYUKI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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