METHOD OF GAS MIXTURE CLEANING FROM DETRIMENTAL IMPURITIES AND DEVICE FOR ITS ACCOMPLISHMENT

FIELD: gas cleaning technology. SUBSTANCE: cleaning process is conducted by selective dissociation of impurities at transverse exposure of gas flow to the effect of a pulsed source of ultra-violet radiation at an intensity of light flux and pulse length in arc selected from condition I·τ =1/G·σ, pul...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Kamrukov A.S, Protasov Ju.S, Vasilevskij V.V, Kozlov N.P, Gutsevich E.I
Format:	Patent
Sprache:	eng ; rus
Schlagworte:	PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION TRANSPORTING
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