METHOD OF GAS MIXTURE CLEANING FROM DETRIMENTAL IMPURITIES AND DEVICE FOR ITS ACCOMPLISHMENT

FIELD: gas cleaning technology. SUBSTANCE: cleaning process is conducted by selective dissociation of impurities at transverse exposure of gas flow to the effect of a pulsed source of ultra-violet radiation at an intensity of light flux and pulse length in arc selected from condition I·τ =1/G·σ, pulse train repetition frequency f=g≪1/K(τ+τ ) in interval between pulses in pulse train τ ≪, where τ≪τ ≪1/f, where σ section of photodissociation of impurities, K number of pulses of ultra-violet radiation in pulse train; Iradiation flux intensity; τ radiation pulse length; G photochemical yield of impurity dissociation products; f pulse train repetition frequency; g specific cleaning capacity; t pulse interval in arc; t time of diffusion of impurities in gas. The device has a reaction vessel with inlet and outlet connections, ultra-violet radiation sources, dissociation products trap; the plane pulsed sources of ultra-violet radiation are located in pairs along the gas flow and close to it in the square-section reaction vessel; the distance between radiating surfaces (1) is selected from condition 1