METHOD OF MANUFACTURING LOW-RELIEF PHOTOPOLYMER TYPE FORMS BASED ON LIQUID PHOTOPOLYMERISING COMPOSITION

Bibliographische Detailangaben

Hauptverfasser:	LAZARENKO EDUARD T,SU, SHABLIJ IGOR V,SU, KRIKUNENKO MIKHAIL A,SU, GAVENKO SVETLANA F,SU
Format:	Patent
Sprache:	eng ; rus
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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