PHOTOPOLYMERIZING COMPOSITION FOR PREPARING OF MATRIX PROTECTIVE RELIEF FOR GALVANOPLASTIC ACCUMULATING

FIELD: photography. SUBSTANCE: composition has the following ratio of components, wt. -% : copolymer 15-36; dimethacrylate triethylene glycol 25-33; benzoin isobutyl ester 1.0-1.5; 3,5-di-tert. -butyl-benzoquinone-1,2 0.02-0.05, and ethanol - the rest. The source of copolymer: copolymer of methacryl...

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Hauptverfasser:	SHUL'PIN G.P, KNJAZEVA T.E, TARANETS V.P, SEMCHIKOV JU.D, TREUSHNIKOV V.M, OLEJNIK A.V, ESIN S.A, KALASHNIKOV B.P, ZUEVA T.A, MODEVA SH.I
Format:	Patent
Sprache:	eng ; rus
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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