METHOD AND DEVICE FOR ION IMPLANTATION

FIELD: physics. SUBSTANCE: device has plasma source 1 provided with power system, system 2 for acceleration of ion beam, start pulse generator 3, pulse delay circuit 4, system 5 of detection and treatment of characteristic X-ray pulses. preamplifier 6, detector 7, isolator 8, additional isolated spe...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Рuzyrevich А.G, Кompaniets А.А, Dektjarev S.V, Rjabchikov А.I, Shipilov А.L
Format:	Patent
Sprache:	eng ; rus
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
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